Research Summary:
Etching & Polishing
- Design new RIE-ICP chamber for homogeneous wafer etching and electron-assisted atomic removal
- Multi-physics simulation (plasma discharge + flow + PIC models) to guide chamber parameters
Plasma medicine
Plasma for cancer therapy, wound healing, biocoating, and transdermal drug delivery
Plasma AI
Plasma-Assisted Polishing (PAP)
- APPJ used to functionalize diamond surfaces via –OH/–O terminal generation; studying C-atom removal mechanisms at atomic-layer precision