蔡坤諭副教授的著作列表 - Publication List of Kuen-Yu Tsai

Publication List of 蔡坤諭 Kuen-Yu Tsai

Journal articles & book chapters:

  1. Pulikanti Guruprasad Reddy*, Neha Thakur, Chien-Lin Lee, Sheng-Wei Chien, Chullikkattil P. Pradeep, Subrata Ghosh*, Kuen-Yu Tsai*, and Kenneth E. Gonsalves*, “Heavy metal incorporated helium ion active hybrid non-chemically amplified resists: Nano-patterning with low line edge roughness,” AIP Advances, 7, 085314, Aug. 2017
  2. Yen-Min Lee, Szu-Hung Chen, Chen-Pin Hsu, Pei-Chuen Chiou, Kuen-Yu Tsai, Tien-Tung Chung, Cheng-Han Tsai, Zhan-Yu Liu, Jia-Han Li*, “Supplementary zones-surrounded Fresnel zone plate with enhanced optical resolution,” Journal of Optics, Volume 17, Number 8, 085608, Aug. 2015
  3. Ting-Hang Pei*, Kuen-Yu Tsai, and Jia-Han Li, “Comparison of the vectorial diffraction theory and Fraunhofer approximation method on diffractive images of Fresnel zone plates,” Optical and Quantum Electronics, Volume 47, Issue 7, 1557-1567, Jul. 2015
  4. Hsuan-Ping Lee, Sheng-Yung Chen, Chun-Hung Liu, Ding-Qi, Yu-Tian Shen, and Kuen-Yu Tsai*, “Design of an electron-optical system with a ball-tip emission source through a numerical optimization method for high-throughput electron-beam–direct-write lithography,” Japanese Journal of Applied Physics, 54, 06FD01, May 2015
  5. Yen-Min Lee, Jia-Han Li*, Fu-Min Wang, Hsin-Hung Cheng, Yu-Tian Shen, Kuen-Yu Tsai, Jason Shieh, and Alek Chen, “Optical scatterometry system for detecting specific line edge roughness of resist gratings subject to detector noises,” Journal of Optics, Volume 16, Number 6, 065706, May 2014
  6. Ting-Hang Pei *, Feng-Chun Yeh, Kuen-Yu Tsai, Jia-Han Li, Zu-Rong Liu, Chang-Li Hung, “Simulation and experiment of speckle reduction by the beam splitting method on a pico-projection system,” Advanced Materials Research, Volume 933, 572-577, May 2014
  7. Yen-Min Lee, Hsin-Hung Cheng, Jia-Han Li*, Kuen-Yu Tsai, and Yu-Tian Sheng, “Refractive index and effective thickness measurement system for the RGB color filter coatings with absorption and scattering properties,” Journal of Display Technology, Volume 10, Number 1, 57-70, Jan. 2014
  8. Yen-Min Lee , Jia-Han Li*, and Kuen-Yu Tsai, “Void-based photonic crystal mirror with high-reflectivity and low-dissipation for extreme-ultraviolet radiation,” Journal of Micro/Nanolithography, MEMS, and MOEMS, Volume 12, Number 4, 043005, Oct. 2013
  9. Philip C. W. Ng, Kuen-Yu Tsai*, and Lawrence S. Melvin III, “Study of etching bias modeling and correction strategies for compensation of patterning process effects,” Microelectronic Engineering, Volume 110, 147–151, Oct. 2013
  10. Yen-Min Lee, Jia-Han Li*, Tony Wen-Hann Sheu, Kuen-Yu Tsai, and Jia-Yush Yen, “Solution-refined method for electric potential distribution of large-scale electron optics,” Japanese Journal of Applied Physics, Volume 52, Number 5, 055202, May 2013
  11. Chun-Hung Liu, Philip C. W. Ng, Yu-Tian Shen, Sheng-Wei Chien, and Kuen-Yu Tsai*, “Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam-direct-write lithography,” Journal of Vacuum Science & Technology B (Top 20 Most Downloaded Articles, Feb. 2013), Volume 31, Issue 2, 021605, Feb. 2013
  12. Hoi-Tou Ng, Yu-Tian Shen, Sheng-Yung Chen, Chun-Hung Liu, Philip C. W. Ng, and Kuen-Yu Tsai*, “New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints,” Journal of Micro/Nanolithography, MEMS, and MOEMS, Volume 11, Number 3, 033007, Sept. 2012
  13. Chun-Hung Liu, Hoi-Tou Ng, and Kuen-Yu Tsai*, “New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography,” Journal of Micro/Nanolithography, MEMS, and MOEMS, Volume 11, Number 1, 013009, Mar. 2012
  14. Sheng-Yung Chen, Hoi-Tou Ng, Shiau-Yi Ma, Hsing-Hong Chen, Chun-Hung Liu, and Kuen-Yu Tsai*, “Lithography-patterning-fidelity-aware electron-optical system design optimization,” Journal of Vacuum Science and Technology B, Volume 29, Number 6, 06FD04, Dec. 2011
  15. Philip C. W. Ng, Kuen-Yu Tsai*, and Lawrence S. Melvin III, “Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects,” Journal of Micro/Nanolithography, MEMS, and MOEMS, Volume 10, Issue 3, 033010, Sept. 2011
  16. Sheng-Yung Chen, Kuen-Yu Tsai*, Philip C. W. Ng, Hoi-Tou Ng, Chun-Hung Liu, Yu-Tian Shen, Chieh-Hsiung Kuan, Yung-Yaw Chen, Yi-Hung Kuo, Cheng-Ju Wu, and Jia-Yush Yen, “In situ beam drift detection using a two-dimensional electron-beam position monitoring system for multiple-electron-beam–direct-write lithography,” Journal of Vacuum Science and Technology B, Volume 29, Number 4, 041607, Aug. 2011
  17. Yi-Hung Kuo, Cheng-Ju Wu, Jia-Yush Yen*, Sheng-Yung Chen, Kuen-Yu Tsai, and Yung-Yaw Chen, “Silicon photodiodes for electron beam position and drift detection in scanning electron microscopy and electron beam lithography system,” Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, Volume 645, Issue 1, 84-89, Jul. 2011
  18. Philip C. W. Ng, Sheng-Wei Chien, Bo-Sen Chang, Kuen-Yu Tsai*, Yi-Chang Lu, Jia-Han Li, and Alek C. Chen, “Impact of process-effect correction strategies on variability of critical dimension and electrical characteristics in extreme ultraviolet lithography,” Japanese Journal of Applied Physics, Volume 50, Number 6 (Special issue: MNC 2010), 06GB07, Jun. 2011
  19. Chien-Wei Chiu, Ting-Wei Liao, Kuen-Yu Tsai, Fu-Min Wang, Yuen-Wuu Suen*, and Chieh-Hsiung Kuan*, “Fabrication method of high-quality Ge nanocrystals on patterned Si substrates by local melting point control,” Nanotechnology, 22, 275604, May 2011
  20. Philip C. W. Ng, Kuen-Yu Tsai*, Yen-Min Lee, Fu-Min Wang, Jia-Han Li, and Alek C. Chen, “Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects,” Journal of Micro/Nanolithography, MEMS, and MOEMS, Volume 10, Issue 1, 013004, Mar. 2011
  21. Yen-Min Lee, Jia-Han Li*, Philip C. W. Ng, Ting-Hang Pei, Fu-Min Wang, Kuen-Yu Tsai, and Alek C. Chen, “Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method,” Journal of Micro/Nanolithography, MEMS, and MOEMS, Volume 9, Issue 4, 043003, Dec. 2010
  22. Ting-Hang Pei*, Kuen-Yu Tsai, and Jia-Han Li, “Stochastic simulation of photon propagation in Si for extreme-ultraviolet mask-defect inspection,” Applied Physics Letters, Volume 97, Issue 6, 061108, Aug. 2010
  23. Sheng-Yung Chen, Shin-Chuan Chen, Hsing-Hong Chen, Kuen-Yu Tsai*, and Hsin-Hung Pan, “Manufacturability analysis of a micro-electro-mechanical systems–based electron-optical system design for direct-write lithography,” Japanese Journal of Applied Physics, Volume 49, Number 6 (Special issue: MNC 2009), 06GE05, Jun. 2010
  24. Kuen-Yu Tsai*, Sheng-Yung Chen, Ting-Han Pei, and Jia-Han Li, “Fresnel zone plate manufacturability analysis for direct-write lithography by simulating focusing and patterning performance versus fabrication errors,” Japanese Journal of Applied Physics, Volume 49, Number 6 (Special Issue: MNC 2009), 06GD08, Jun. 2010
  25. Ni Hu, Arthur Tay*, and Kuen-Yu Tsai, “A fast in situ approach to estimating wafer warpage profile during thermal processing in microlithography,” Measurement Science and Technology, Volume 17, 2006, 2233-2240, Jul. 2006
  26. Kuen-Yu Tsai* and Haitham A. Hindi, “DQIT: /spl mu/-synthesis without D-scale fitting,” Automatic Control, IEEE Transactions on, Volume 49, Issue 11, 2028-2032, Nov. 2004
  27. Kuen-Yu Tsai*, Charles D. Schaper, and Thomas Kailath, “Design of feedforward filters for improving tracking performances of existing feedback control systems,” Control Systems Technology, IEEE Transactions on, Volume 12, Issue 5, 742-749, Sept. 2004

Conference & proceeding papers:

  1. Chien-Lin Lee, Jia-Syun Cai, Sheng-Wei Chien, Kuen-Yu Tsai*, “Precision fabrication of EUVL programmed defects with helium ion beam patterning,” (invited talk) The 26th Lithography Workshop, La Quinta, California, USA, Nov. 2019
  2. Xin-Yang Zheng, Jia-Syun Cai, Chien-Lin Lee, Sheng-Wei Chien, Kuen-Yu Tsai*, “Impacts of limited EUV lithography fidelity on vertical nanowire transistor electrical characteristics,” The 32th International Microprocesses and Nanotechnology Conference (MNC 2019), Hiroshima, Japan, Oct. 2019
  3. Chien-Lin Lee, Jia-Syun Cai, Sheng-Wei Chien, Kuen-Yu Tsai*, “Precision fabrication of EUVL programmed defects with helium ion beam lithography,” Photomask Technology + EUV Lithography 2019 - Proc. SPIE Vol. 11147, International Conference on Extreme Ultraviolet Lithography, 111471J, Monterey, California, USA, Sept. 2019
  4. Chien-Lin Lee, Jia-Syun Cai, Sheng-Wei Chien, Kuen-Yu Tsai*, “Helium ion beam lithography with high patterning fidelity,” (Invited Talk) The 80th JSAP Autumn Meeting, Symposium T20 Advanced ion microscopy - Application for future nano scale materials, Sapporo, Japan, Sept. 2019
  5. Jia-Syun Cai, Sheng-Wei Chien, Chien-Lin Lee, Kuen-Yu Tsai*, James P. Shiely, Matt St. John, “Investigation on MBOPC convergence improvement with location-dependent correction factors aided by machine learning,” Advanced Lithography 2019 -- Proc. SPIE Vo. 10961, Optical Microlithography XXXII, 1096107, San Jose, California, USA, Mar. 2019
  6. Jia-Syun Cai, Sheng-Wei Chien, Xin-Yang Zheng, Chien-Lin Lee, Kuen-Yu Tsai*, “Accuracy improvement of electrical characteristics estimation for sub-20nm FDSOI devices with non-rectangular gates,” Advanced Lithography 2019 -- Proc. SPIE Vol. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII, 109620I, San Jose, California, USA, Mar. 2019
  7. Chien-Lin Lee, Sheng-Wei Chien, Kuen-Yu Tsai*, “Characterization of proximity effects in helium ion beam lithography by direct Monte Carlo simulation and resist calibration,” The 31th International Microprocesses and Nanotechnology Conference (MNC 2018), 15A-5-4, Sapporo, Japan, Nov. 2018
  8. Chien-Lin Lee, Sheng-Wei Chien, Kuen-Yu Tsai*, “Simulation-based proximity effect correction for helium ion beam lithography,” (Invited Talk) International workshop on Nano/micro 2d-3d fabrication, manufacturing of electronic – biomedical devices & appli, Mandi, India, Oct. 2018
  9. Chien-Lin Lee, Sheng-Wei Chien, Kuen-Yu Tsai*, “Focused helium ion beam applications in advanced-node nanolithography R/D,” (Invited Talk) 1st Annual Zeiss Process Control Innovations Seminar (PCIS), Singapore, Jul. 2018
  10. Chien-Lin Lee, Sheng-Wei Chien, Kuen-Yu Tsai*, “Model-based proximity effect correction for helium ion beam lithography,” Advanced Lithography 2018 -- Proc. SPIE Vol. 10584 Novel Patterning Technologies 2018, 105841C, San Jose, California, USA, Feb. 2018
  11. Chien-Lin Lee, Sheng-Wei Chien, Kuen-Yu Tsai*, “Fabrication of programmed defects for non-imaging EUV mask inspection by helium ion beam direct milling,” The 30th International Microprocesses and Nanotechnology Conference (MNC 2017), 8P-7-1 (poster), JeJu, Korea, Nov. 2017
  12. Chien-Lin Lee, Sheng-Wei Chien, Sheng-Yung Chen, Chun-Hung Liu, Kuen-Yu Tsai*, Jia-Han Li, Bor-Yuan Shew, Chit-Sung Hong, Chao-Te Lee, “Fabrication of metrology test structures with helium ion beam direct write,” (Invited Talk) The 1st ZEISS Helium Ion Microscopy Summit, Beijing, China, Sept. 2017
  13. Chien-Lin Lee, Sheng-Wei Chien, Sheng-Yung Chen, Chun-Hung Liu, Kuen-Yu Tsai*, Jia-Han Li, Bor-Yuan Shew, Chit-Sung Hong, Chao-Te Lee, “Fabrication of metrology test structures with helium ion beam direct write,” Advanced Lithography 2017 -- Proc. SPIE Vol. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI, 1014519, San Jose, California, USA, Feb. 2017
  14. Sheng-Wei Chien, Kuen-Yu Tsai*, Jia-Han Li, “Fabrication of metrology test structures with programmed imperfection using helium ion beam direct write,” (Invited Talk) 2016 ZEISS Korea Microscopy Workshop, Gumi, Korea, Jun. 2016
  15. Ding Qi, Kuen-Yu Tsai*, and Jia-Han Li, “A new EUV mask blank defect inspection method with coherent diffraction imaging,” (Invited Talk) 2014 International Workshop on EUV Lithography, Session 6: EUV Masks, Maui, Hawaii, USA, Jun. 2014
  16. Hao-Yun Yu, Chun-Hung Liu, Yu-Tian Shen, Hsuan-Ping Lee, and Kuen-Yu Tsai*, “Improvement in electron-beam lithography throughput by exploiting relaxed patterning fidelity requirements with directed self-assembly,” Advanced Lithography 2014 -- Proc. SPIE Vol. 9049, Alternative Lithographic Technologies VI, 90492C, San Jose, California, USA, Feb. 2014
  17. Yi-Yeh Yang, Hsuan-Ping Lee, Chun-Hung Liu, Hao-Yun Yu, Kuen-Yu Tsai*, Jia-Han Li, “Direct-scatterometry-enabled PEC model calibration with two-dimensional layouts,” Advanced Lithography 2014 -- Proc. SPIE Vol. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 905032, San Jose, California, USA, Feb. 2014
  18. Chih-Yu Chen, Philip C. W. Ng, Chun-Hung Liu, Yu-Tian Shen, Kuen-Yu Tsai*, Jia-Han Li, Jason J. Shieh, and Alek C. Chen, “Direct-scatterometry-enabled optical-proximity-correction-model calibration,” Advanced Lithography 2013 -- Proc. SPIE Vol. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII, 86810U, San Jose, California, USA, Feb. 2013
  19. Cheng-Hong Lin, Yi-Chang Lu, Chin-Khai Tang, and Kuen-Yu Tsai, “The effect of NBTI on 3D integrated circuits,” Electrical Design of Advanced Packaging and Systems Symposium (EDAPS), 2012 IEEE, 201 - 204, Taipei, Taiwan, Dec. 2012
  20. Yen-Min Lee, Jia-Han Li*, Tony Wen-Hann Sheu, Kuen-Yu Tsai, and Jia-Yush Yen, “Solution-refined method for solving large-scale computation problems: Taking the Laplace's equation as an example,” NCHC High-performance Computing Conference, (poster, the First Prize 特優獎), Hsin-Chu, Taiwan, Oct. 2012
  21. Philip C.W. Ng, Kuen-Yu Tsai*, and Lawrence S. Melvin III, “Study of etching bias modeling and correction strategies for patterning processes,” 38th International Micro & Nano Engineering Conference (MNE 2012), P071-559 (poster; MEE), Toulouse, France, Sept. 2012
  22. Sheng-Yung Chen, Shiau-Yi Ma, and Kuen-Yu Tsai*, “Architecture and EOS design flow of a multiple-electron-beam–direct-write system considering patterning fidelity, breakdown effect,” 38th International Micro & Nano Engineering Conference (MNE 2012), O-LITH II-581(oral presentation), Toulouse, France, Sept. 2012
  23. Chih-Yu Chen, Kuen-Yu Tsai*, Yu-Tian Shen, Yen-Min Lee, Jia-Han Li, Jason J. Shieh, and Alek C. Chen, “Direct-scatterometry-enabled lithography model calibration,” Advanced Lithography 2012 -- Proc. SPIE Vol. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI, 83241R, San Jose, California, USA, Feb. 2012
  24. Yu-Tian Shen, Chun-Hung Liu, Chih-Yu Chen, Hoi-Tou Ng, Kuen-Yu Tsai*, Fu-Ming Wang, Chieh-Hsiung Kuan, Yen-Min Lee, Hsin-Hung Cheng, Jia-Han Li, and Alek C. Chen, “Electron-beam proximity effect model calibration for fabricating scatterometry calibration samples,” Advanced Lithography 2012 -- Proc. SPIE Vol. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI, 83242K, San Jose, California, USA, Feb. 2012
  25. Yen-Min Lee, Jia-Han Li*, Fu-Min Wang, Hsin-Hung Cheng, Yu-Tian Shen, Kuen-Yu Tsai, and Alek C. Chen, “Optical metrology of shape-varying nano-patterned gratings by analyzing the scattering signals in their pupil images,” International Microprocesses and Nanotechnology Conference Digest of Papers, 26P-7-4 (poster), Kyoto, Japan, Oct. 2011
  26. Sheng-Yung Chen, Hoi-Tou Ng, Shiau-Yi Ma, Hsing-Hong Chen, Kuen-Yu Tsai*, “Lithography-patterning-fidelity-aware electron-optical system design optimization,” The 55th International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication, P2-33 (poster; JVST B), Las Vegas, Nevada, USA, May 2011
  27. Philip C. W. Ng, Sheng-Wei Chien, Bo-Sen Chang, Kuen-Yu Tsai*, and Yi-Chang Lu, “Impact of process effects correction strategies on critical dimension and electrical characteristics variabilities in extreme ultraviolet lithography,” International Microprocesses and Nanotechnology Conference 2010 Digest of Papers, 11D-8-6 (poster; JJAP), Fukuoka, Japan, Nov. 2010
  28. Fu-Min Wang*, Kuen-Yu Tsai, Jia-Han Li, Alek C. Chen, Yen-Min Lee, Yu-Tian Shen, Hsin-Hung Cheng, and Chieh-Hsiang Kuan, “Fabrication of metrology test structures with programmed line edge roughness using electron beam direct write,” International Microprocesses and Nanotechnology Conference 2010 Digest of Papers, 12D-11-58 (poster), Fukuoka, Japan, Nov. 2010
  29. Yen-Min Lee, Jia-Han Li*, Sheng-Yung Chen, Shiau-Yi Ma, Kuen-Yu Tsai, Tony W. H. Sheu, and Jia-Yush Yen, “Iterative finite-difference method for analyzing fabrication errors of lens-misaligned electron-beam direct-write lithography system,” International Microprocesses and Nanotechnology Conference 2010 Digest of Papers, 12D-11-8 (poster; JJAP), Fukuoka, Japan, Nov. 2010
  30. Zhan-Yu Liu, Yao-Jen Tsai, Jia-Han Li*, and Kuen-Yu Tsai, “High spatial resolution and large field intensity by a set of two modified zone plates,” Frontiers in Optics (FiO)/Laser Science XXVI (LS) Conference, FThD6 (oral), Rochester, New York, USA, Oct. 2010
  31. Sheng-Yung Chen, Chieh-Chien Huang, Shin-Chuan Chen, Ting-Han Pei, and Kuen-Yu Tsai*, “Analysis of fabrication misalignment effects in a MEMS-based electron-optical system design for direct-write lithography,” The 54th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, P2-9 (poster), Anchorage, Alaska, USA, Jun. 2010
  32. Sheng-Yung Chen, Kuen-Yu Tsai*, Hoi-Tou Ng, Chi-Hsiung Fan, Ting-Han Pei, Chieh-Hsiung Kuan, Yung-Yaw Chen, Yi-Hung Kuo, Cheng-Ju Wu, and Jia-Yush Yen, “Beam drift detection using a two-dimensional electron beam position monitor system for multiple-electron-beam–direct-write lithography,” The 54th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, P2-10 (poster; JVST B), Anchorage, Alaska, USA, Jun. 2010
  33. Chun-Hung Liu, Philip Ng, Yu-Tian Shen, Hoi-Tou Ng, and Kuen-Yu Tsai*, “Impacts of point spread function calibration methods on model-based proximity effect correction for electron-beam-direct-write lithography,” The 54th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, P2-17 (poster; JVST B), Anchorage, Alaska, USA, Jun. 2010
  34. Fu-Min Wang*, Susumu Ono, Hsin-Hung Su, Kuen-Yu Tsai, and Chieh-Hsiung Kuan, “10 nm lines with 14 nm half pitch grating written in HSQ by electron beam direct write at 5 keV,” The 54th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, P2-19 (poster), Anchorage, Alaska, USA, Jun. 2010
  35. Philip C. W. Ng, Kuen-Yu Tsai*, and Lawrence S. Melvin III, “A non-delta-chrome OPC methodology for nonlinear process models,” The 54th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, P16-6 (poster; JM3), Anchorage, Alaska, USA, Jun. 2010
  36. Ming-Shing Su*, Kuen-Yu Tsai, Yi-Chang Lu, Yu-Hsuan Kuo, Ting-Hang Pei, and Jia-Yush Yen, “Architecture for next-generation massively parallel maskless lithography system (MPML2),” Advanced Lithography 2010 -- Proc. SPIE 7637, Alternative Lithographic Technologies II, 76371Q, San Jose, California, USA, Feb. 2010
  37. Ting-Hang Pei, Kuen-Yu Tsai*, and Jia-Han Li, “Stochastic simulation of photon scattering for EUV mask defect inspection,” Advanced Lithography 2010 -- Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 763624; APL, San Jose, California, USA, Feb. 2010
  38. Chun-Hung Liu, Pei-Lin Tien, Philip C. W. Ng, Yu-Tian Shen, and Kuen-Yu Tsai*, “Model-based proximity effect correction for electron-beam direct-write lithography,” Advanced Lithography 2010 -- Proc. SPIE 7637, Alternative Lithographic Technologies II, 76371V, San Jose, California, USA, Feb. 2010
  39. Philip C. W. Ng, Kuen-Yu Tsai*, Chih-Hsien Tang, and Lawrence S. Melvin III, “A non-delta-chrome OPC methodology for process models with three-dimensional mask effects,” Advanced Lithography 2010 -- Proc. SPIE 7640, Optical Microlithography XXIII, 76402P; JM3, San Jose, California, USA, Feb. 2010
  40. Kuen-Yu Tsai*, Wei-Jhih Hsieh, Yuan-Ching Lu, Bo-Sen Chang, Sheng-Wei Chien, Yi-Chang Lu, “A new method to improve accuracy of parasitics extraction considering sub-wavelength lithography effects,” ASP-DAC 2010, The 15th Asia and South Pacific Design Automation Conference, 651-656, Taipei, Taiwan, Jan. 2010
  41. Philip C. W. Ng, Kuen-Yu Tsai*, Yen-Min Lee, Ting-Han Pei, Fu-Min Wang, Jia-Han Li, and Alek C. Chen, “A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows,” Lithography Asia 2009 -- Proc. SPIE Vol. 7520, 75200S (JM3), Taipei, Taiwan, Nov. 2009
  42. Yen-Min Lee*, Jia-Han Li, Philip C. W. Ng, Ting-Han Pei, Fu-Min Wang, Kuen-Yu Tsai, and Alek C. Chen, “Using transmission line theory to calculate equivalent refractive index of EUV mask multilayer structures for efficient scattering simulation by finite-difference time-domain method,” Lithography Asia 2009, Proc. SPIE Vol. 7520, 75200W, (Best Student Paper Award; JM3), Taipei, Taiwan, Nov. 2009
  43. Sheng-Yung Chen, Kuen-Yu Tsai*, Hoi-Tou Ng, Chi-Hsiang Fan, Ting-Hang Pei, Chieh-Hsiung Kuan, Yung-Yaw Chen, and Jia-Yush Yen, “Preliminary design of a two-dimensional electron beam position monitor system for multiple-electron-beam-direct-write lithography,” Lithography Asia 2009 -- Proc. SPIE Vol. 7520, 75202K (JVST B), Taipei, Taiwan, Nov. 2009
  44. Hoi-Tou Ng, Chun-Hung Liu, Hsing-Hong Chen, Kuen-Yu Tsai*, “Determination of Gaussian beam and raster scan parameters in electron-beam-direct-write lithography considering device patterning and performance variability,” Lithography Asia 2009, 7520-99 (poster; JM3), Taipei, Taiwan, Nov. 2009
  45. Ting-Hang Pei, Kuen-Yu Tsai*, and Jia-Han Li, “Effects of Fresnel zone plate fabrication errors on focusing performances,” International Microprocesses and Nanotechnology Conference 2009 Digest of Papers, 164-165 (poster 18D-7-9; JJAP), Sapporo, Japan, Nov. 2009
  46. Sheng-Yung Chen, Shin-Chuan Chen, Hsing-Hong Chen, Ting-Han Pei, Kuen-Yu Tsai*, and Hsin-Hung Pan, “Manufacturability analysis of a MEMS-based electron-optical system design for direct-write lithography,” International Microprocesses and Nanotechnology Conference 2009 Digest of Papers, 174-175 (poster 18D-7-13; JJAP), Sapporo, Japan, Nov. 2009
  47. Fu-Min Wang*, S. Ono, Hsing-Hong Su, Kuen-Yu Tsai, and Chieh-Hsiung Kuan, “High resolution electron beam direct write on ZEP520 at 5 KeV,” International Microprocesses and Nanotechnology Conference 2009 Digest of Papers, 178-179 (poster 18D-7-15), Sapporo, Japan, Nov. 2009
  48. Chih-Hsien Tang*, Kuen-Yu Tsai, “A simple design rule check for DP decomposition,” Design Automation Conference 2009, (User Track Poster Session), San Francisco, California, USA, Jul. 2009
  49. Jia-Yush Yen*, Cheng-Hung Chen, Lien-Sheng Chen, Kuen-Yu Tsai, and Shuo-Hung Chang, “Hybrid servo design for large area nano pattern stitching,” Advanced Intelligent Mechatronics, 2009. AIM 2009. IEEE/ASME International Conference on, 1572 - 1576, Singapore, Jul. 2009
  50. Chun-Hung Liu, Hoi-Tou Ng, Kuen-Yu Tsai*, “A new parametric proximity effect model calibration method for improving accuracy of post-lithography patterning prediction in sub-32-nm half-pitch low-voltage electron beam direct-write lithography,” The 53th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication 2009, P-1F-17 (poster; JM3), Marco Island, Florida, USA, May 2009
  51. Hoi-Tou Ng, Chun-Hung Liu, Hsing-Hong Chen, Kuen-Yu Tsai*, “Selection of Gaussian-beam and raster-scan parameters in electron-beam direct-write lithography considering device patterning and performance variability,” Advanced Lithography 2009, 7271-22 (oral presentation; JM3), San Jose, California, USA, Feb. 2009
  52. Chun-Hung Liu, Hoi-Tou Ng, Philip C. W. Ng, Kuen-Yu Tsai*, Shy-Jay Lin, and Jeng-Horng Chen, “A novel curve-fitting procedure for determining proximity effect parameters in electron beam lithography,” Lithography Asia 2008 -- Proc. SPIE Vol. 7140, 71401I; JM3, Taipei, Taiwan, Nov. 2008
  53. Kuen-Yu Tsai*, Meng-Fu You, Yi-Chang Lu, and Philip C. W. Ng, “A new method to improve accuracy of leakage current estimation for transistors with non-rectangular gates due to sub-wavelength lithography effects,” ICCAD 2008, IEEE/ACM International Conference on Computer-Aided Design, 286-291, San Jose, California, USA, Nov. 2008
  54. Yi-Sheng Su, Philip C. W. Ng, Kuen-Yu Tsai*, and Yung-Yaw Chen, “Design of automatic controllers for model-based OPC with optimal resist threshold determination for improving correction convergence,” Advanced Lithography 2008 -- Proc. SPIE Vol. 6924, Optical Microlithography XXI, 69243Z; JM3, San Jose, California, USA, Mar. 2008
  55. Arthur Tay*, Weng-Khuen Ho, Ni Hu, Choon-Meng Kiew, and Kuen-Yu Tsai, “Real-time spatial control of photoresist development rate,” Advanced Lithography 2007 -- Proc. SPIE Vol. 6518, Metrology, Inspection, and Process Control for Microlithography, 65182N, San Jose, California, USA, Mar. 2007
  56. Meng-Fu You, Philip C. W. Ng, Yi-Sheng Su, Kuen-Yu Tsai*, and Yi-Chang Lu, “Impacts of optical proximity correction settings on electrical performances,” Advanced Lithography 2007 -- Proc. SPIE Vol. 6521, Design for Manufacturability through Design-Process Integration, 65210W; JJAP, San Jose, California, USA, Mar. 2007
  57. Yea-Chin Yeh, Chun-Hung Liu, Kuen-Yu Tsai*, Yu-Chen Kung, Jia-Yush Yen*, and Jyh-Fa Lee, “Identifications of the PZT Actuated Novel Optical Scanning System,” IFAC Workshop on Advanced Process Control for Semiconductor Manufacturing, Singapore, Dec. 2006
  58. Chun-Hung Liu, Yea-Chin Yeh, Kuen-Yu Tsai*, Jia-Yush Yen*, Arthur Tay, and Jyh-Fa Lee, “Feedback control of piezo-based nanopositioning systems for semiconductor manufacturing,” IFAC Workshop on Advanced Process Control for Semiconductor Manufacturing, Singapore, Dec. 2006
  59. Arthur Tay*, Weng-Khuen Ho, Ni Hu, Kuen-Yu Tsai, and Ying Zhou, “Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography,” Advanced Lithography 2006 -- Proc. SPIE Vol. 6155, Data Analysis and Modeling for Process Control II, 61550A, San Jose, California, USA, Mar. 2006
  60. Kuen-Yu Tsai*; Eric M. Gullikson, Patrick Kearney, and Alan R. Stivers, “On the sensitivity improvement and cross-correlation methodology for confocal EUV mask blank defect inspection tool fleet,” 25th Annual BACUS Symposium on Photomask Technology -- Proc. of SPIE Vol. 5992, 599240, Monterey, California, USA, Oct. 2005
  61. Arthur Tay*, Weng Khuen Ho, Christopher Yap, Chen Wei, and Kuen-Yu Tsai, “In-situ fault detection of wafer warpage in lithography,” Proceedings of 16th IFAC World Congress, (MST), Prague, Czech Republic, Jul. 2005
  62. Eric M. Gullikson*, Edita Tejnil, Kuen-Yu Tsai, Alan R. Stivers, and H. Kusunose, “Modeling the defect inspection sensitivity of a confocal microscope,” Microlithography 2005 -- Proc. SPIE Vol. 5751, Emerging Lithographic Technologies IX, 1223-1229, San Jose, California, USA, Mar. 2005
  63. Arthur Tay*, Weng-Khuen Ho, Xiaodong Wu, and Kuen-Yu Tsai, “Real-time control of photoresist absorption coefficient uniformity,” Microlithography 2005 -- Proc. SPIE Vol. 5755, Data Analysis and Modeling for Process Control II, 187-195, San Jose, California, USA, Mar. 2005
  64. Kuen-Yu Tsai* and Haitham A. Hindi, “DQIT: /spl mu/-synthesis without D-scale fitting,” Proceedings of the American Control Conference, v 1, 2002, 493-498; TAC, Anchorage, Alaska, USA, May 2002
  65. Kuen-Yu Tsai*, Charles D. Schaper, and Thomas Kailath, “Design of feedforward filters for improving tracking performances of existing feedback control systems,” Proceedings of the American Control Conference, v 6, 2002, 4988-4993; TCST, Anchorage, Alaska, USA, May 2002
  66. Kuen-Yu Tsai* and Jia-Yush Yen, “Servo system design of a high-resolution piezo-driven fine stage for step-and-repeat microlithography systems,” Industrial Electronics Society, 1999. IECON '99 Proceedings. The 25th Annual Conference of the IEEE v 1, 1999, 11-16, San Jose, California, USA, Nov. 1999

Patents:

  1. Kuen-Yu Tsai*, Chun-Hung Liu (National Taiwan University/Taiwan Semiconductor Manufacturing Company), “Method and System for Establishing Parametric Model (參數化模型的建立方法及系統),” ROC (Taiwan) I575392, Mar. 2017
  2. Kuen-Yu Tsai*, Miin-Jang Chen, Si-Chen Lee (National Taiwan University/Taiwan Semiconductor Manufacturing Company), “Projection Patterning With Exposure Mask,” United States Patent 9,570,301, Feb. 2017
  3. Kuen-Yu Tsai*, Alek C. Chen, and Jia-Han Li (National Taiwan University/ASML Netherlands B.V.), “Method for Calibrating A Manufacturing Process Model,” United States Patent 9,541,500, Jan. 2017
  4. Kuen-Yu Tsai*, Chun-Hung Liu (National Taiwan University/Taiwan Semiconductor Manufacturing Company), “Method and System for Establishing Parametric Model,” United States Patent 9,418,049, Aug. 2016
  5. Kuen-Yu Tsai*, Min-Jang Chen, Samuel C. Pan (National Taiwan University/Taiwan Semiconductor Manufacturing Company), “Process for Fabricating Integrated Circuit (積體電路的製程),” ROC (Taiwan) I541860, Jul. 2016
  6. Jia-Han Li*, Yen-Min Lee, Kuen-Yu Tsai (National Taiwan University), “Multilayer Mirror Structure (多層反射鏡結構),” ROC (Taiwan) I494616, Aug. 2015
  7. Kuen-Yu Tsai*, Meng-Fu You, and Yi-Chang Lu (National Taiwan University/Taiwan Semiconductor Manufacturing Company), “Determining Proximity Effect Parameters for Non-Rectangular Semiconductor Structures,” United States Patent 9,087,173, Jul. 2015
  8. Kuen-Yu Tsai*, Sheng-Yung Chen, Jia-Yush Yen, Yung-Yaw Chen, Chi-Hsiang Fan (National Taiwan University), “System and Method for Estimating Change of Status of Particle Beams (粒子束狀態改變監測系統及其方法),” ROC (Taiwan) I452598, Sept. 2014
  9. Kuen-Yu Tsai*, Sheng-Yung Chen (National Taiwan University), “Method for Adjusting Status of Particle Beams for Patterning A Substrate and System Using the Same (於一基板上製作圖案時之粒子束狀態調整方法及其系統),” ROC (Taiwan) I449076, Aug. 2014
  10. Kuen-Yu Tsai*, Sheng-Yung Chen, Hoi-Tou Ng, and Shiau-Yi Ma (National Taiwan University), “Method and Apparatus For Designing Patterning Systems Considering Patterning Fidelity (基於圖案製作真確度之圖案製作系統設計方法與裝置),” ROC (Taiwan) I439822, Jun. 2014
  11. Kuen-Yu Tsai*, Sheng-Yung Chen (National Taiwan University), “Apparatus and Method for Estimating Change of Status of Particle Beams (粒子束狀態改變之估測裝置及其方法),” ROC (Taiwan) I441233, Jun. 2014
  12. Jia-Yush Yen*, Kuen-Yu Tsai, Lien-Sheng Chen, Pablo Chiu, and Hsin-Fan Tsai, “Electron-Beam Lithographic Method, System and Method For Controlling Electron-Beam Servo (電子束微影方法、電子束微影伺服控制方法及系統),” ROC (Taiwan) I438818, May 2014
  13. Kuen-Yu Tsai*, Chun-Hung Liu, Chooi-Wan Ng, and Pei-Lin Tien (National Taiwan University), “Method for Compensating Proximity Effect of Particle Beam Lithography Process (粒子束微影程序鄰近效應之補償方法),” ROC (Taiwan) I436174, May 2014
  14. Kuen-Yu Tsai*, Chooi-Wan Ng, Yi-Sheng Su (National Taiwan University/Taiwan Semiconductor Manufacturing Company), “Method for Compensating Effect of Patterning Process and Apparatus Thereof,” United States Patent 8,578,303, Nov. 2013
  15. Yu-Hsuan Kuo*, Ming-Shing Su, Yi-Chang Lu, Kuen-Yu Tsai, “Electron Beam Exposure Apparatus, Electron Beam Generation Apparatus and Exposure Method (電子束曝光裝置、電子束產生裝置及曝光方法),” ROC (Taiwan) I410757, Oct. 2013
  16. Kuen-Yu Tsai*, Chun-Hung Liu, Chooi-Wan Ng, and Pei-Lin Tien (National Taiwan University), “Method for Compensating Proximity Effects of Particle Beam Lithography Processes,” United States Patent 8,539,392, Sept. 2013
  17. Kuen-Yu Tsai*, Sheng-Yung Chen, Hoi-Tou Ng, and Shiau-Yi Ma (National Taiwan University), “Method and Apparatus for Designing Patterning System Based on Patterning Fidelity,” United States Patent 8,490,033, Jul. 2013
  18. Kuen-Yu Tsai*, Wei-Jhih Hsieh, and Bo-Sen Chang (National Taiwan University/Taiwan Semiconductor Manufacturing Company), “Method for Improving Accuracy of Parasitics Extraction Considering Sub-Wavelength Lithography Effects,” United States Patent 8,438,505, May 2013
  19. Kuen-Yu Tsai* (Stanford University), “Method for Fast Design of Multi-objective Frequency-shaping Equalizers,” US Patent 6,992,542 B2, Jan. 2006
  20. Kuen-Yu Tsai* and Haitham A. Hindi (Stanford University), “Method for Design of Multi-objective Robust Controllers,” (abandoned) United States Patent Application 20040225383, Nov. 2004
  21. Miin-Jang Chen*, Kuen-Yu Tsai, Chee-Wee Liu (National Taiwan University/Taiwan Semiconductor Manufacturing Company), “Method For Non-Resist Nanolithography,” (pending) United States Patent Application 20150340469
  22. Kuen-Yu Tsai*, Miin-Jang Chen, Samuel C. Pan (National Taiwan University/Taiwan Semiconductor Manufacturing Company), “Charged-Particle-Beam Patterning Without Resist,” (pending) United States Patent Application 20150221514
  23. Jia-Han Li*, Yen-Min Lee, Kuen-Yu Tsai (National Taiwan University), “Multilayer Mirror Structure,” (pending) United States Patent Application 20150212427
  24. Kuen-Yu Tsai*, Sheng-Yung Chen, and Shih-Chuan Chen (National Taiwan University), “Method and Computer-Aided Design System Of Manufacturing An Optical System,” (pending) United States Patent Application 20130297061
  25. Kuen-Yu Tsai* and Chun-Hung Liu (National Taiwan University/Taiwan Semiconductor Manufacturing Company), “Method and System for Establishing Parametric Model (參數化模型的建立方法及系統),” ROC (Taiwan) (pending)
  26. Kuen-Yu Tsai*, Sheng-Yung Chen, Jia-Yush Yen, Yung-Yaw Chen, Chi-Hsiang Fan (National Taiwan University), “System and Method for Estimating Change of Status of Particle Beams,” (pending) United States Patent Application 20120112086
  27. Kuen-Yu Tsai*, Sheng-Yung Chen (National Taiwan University), “Method for Adjusting Status of Particle Beams for Patterning A Substrate And System Using The Same,” (pending) United States Patent Application 20120112091
  28. Kuen-Yu Tsai*, Sheng-Yung Chen (National Taiwan University), “Apparatus and Method for Estimating Change of Status of Particle Beams,” (pending) United States Patent Application 20120112065

other:

  1. 李建霖,蔡坤諭*,錢盛偉, “聚焦氦離子束微影與鄰近效應修正技術,” Jun. 2019, 機械工業雜誌,2019年6月號 第435期
  2. 李建霖,蔡坤諭*,錢盛偉, “先進製程缺陷檢測設備性能測試標準樣本製作技術,” Sept. 2018, 機械工業雜誌,2018年9月號 第426期
  3. 蔡坤諭*、李建霖、錢盛偉, “極紫外光微影光罩檢測技術,” Jun. 2018, 機械工業雜誌,2018年6月號 第423期
  4. 劉俊宏,余浩澐,蔡坤諭*, “讓摩爾定律成真的關鍵:微影技術 — 影響七十億以上個未來,” Dec. 2013, 臺大電機系科普系列
  5. 蔡坤諭*, “次世代微影技術發展現況與展望:極紫外光光罩檢測技術之現況與展望,” Sept. 2008, 電子月刊,2008年9月號 第158期
  6. Kuen-Yu Tsai*, “Design of Feedforward and Feedback Controllers by Signal Processing and Convex Optimization Techniques,” Sept. 2002, PhD Dissertation, Stanford University (Dissertation advisor: Prof. Stephen P. Boyd; Research advisor: Prof. Thomas Kailath)
  7. Kuen-Yu Tsai*, “Servo System Design of a High-Resolution Piezo-Driven Three Degree-of-Freedom Fine Stage for Integrated-Circuit Wafer Step-and-Repeat Lithography Systems,” Jul. 1997, Master Thesis, National Taiwan University (advisor: Prof. Jia-Yush Yen)